About this scholarly article

SPIE Proceedings [SPIE Microelectronic Processing '93 - Monterey, CA (Sunday 26 September 1993)] Microelectronic Processes, Sensors, and Controls - First-wafer effect on ellipsometer metrics and spatial etch pattern of polysilicon gate etch by Butler, Stephanie W.; Stefani, Jerry A.; Bondur, James A.; Elliott, Kiefer; Hauser, John R.; Kwong, Dim-Lee; Ray, Asit K. is a scholarly article available to read on EtoBox.

Author

Butler, Stephanie W.; Stefani, Jerry A.; Bondur, James A.; Elliott, Kiefer; Hauser, John R.; Kwong, Dim-Lee; Ray, Asit K.

Publisher

SPIE

Published

1994