About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Efficient use of design-based binning methodology in a DRAM fab by Karsenti, Laurent; Allgair, John A.; Raymond, Christopher J.; Wehner, Arno; Fischer, Andreas; Seifert, Uwe; Goeckeritz, Jens; Geshel, Mark; Gscheidlen, Dieter; Bartov, Avishai is a scholarly article available to read on EtoBox.

Author

Karsenti, Laurent; Allgair, John A.; Raymond, Christopher J.; Wehner, Arno; Fischer, Andreas; Seifert, Uwe; Goeckeritz, Jens; Geshel, Mark; Gscheidlen, Dieter; Bartov, Avishai

Publisher

SPIE

Published

2009