About this scholarly article

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Photoresist roughness characterization in additive lithography processes for the fabrication of phase-only optical vortices by Hosseinimakarem, Zahra; Poutous, Menelaos K.; Johnson, Eric G.; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg is a scholarly article available to read on EtoBox.

Author

Hosseinimakarem, Zahra; Poutous, Menelaos K.; Johnson, Eric G.; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg

Publisher

SPIE

Published

2012