About this scholarly article

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Optical Microlithography XI - Cross-sectional critical shape error: a novel methodology for quantifying process simulation accuracy by Mason, Mark E.; Van den Hove, Luc; Soper, Robert A. is a scholarly article available to read on EtoBox.

Author

Mason, Mark E.; Van den Hove, Luc; Soper, Robert A.

Publisher

SPIE

Published

1998