About this scholarly article

1999 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD'99 (IEEE Cat. No.99TH8387) - A practical CMP profile model for LSI design application by Ohta, T.; Toda, T.; Ueno, H. is a scholarly article available to read on EtoBox.

Author

Ohta, T.; Toda, T.; Ueno, H.

Publisher

Japan Soc. Appl. Phys

Published

1999