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About this Engineering article
NEGATIVE RESIST 1, 3-DCPA FOR X-RAY LITHOGRAPHY by SHEN, Wei; DU, Yong-xing is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- SHEN, Wei; DU, Yong-xing
- Publisher
- Japan Science and Technology Information Aggregator, Electronic; The Technical Association of Photopolymers, Japan; Technical Association of Photopolymers; Technical Association of Photopolymers, Japan (ISSN 0914-9244)
- Published
- 1988
- Field
- Engineering (Physical Sciences)