About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Requirements of the inspection for double patterning technology reticles by Cho, Wonil; Allgair, John A.; Raymond, Christopher J.; Kim, Won-Sun; Sohn, Sung-Joon; Lee, Sunpyo; Choi, Jihyeon; Kim, Yonghoon; Cho, HanKu is a scholarly article available to read on EtoBox.

Author

Cho, Wonil; Allgair, John A.; Raymond, Christopher J.; Kim, Won-Sun; Sohn, Sung-Joon; Lee, Sunpyo; Choi, Jihyeon; Kim, Yonghoon; Cho, HanKu

Publisher

SPIE

Published

2009