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About this Engineering article
Thermally Induced Atomic Transport in Nanometric LaAlON Films on Si by Bastos, K. P.; Salvador, L.; Krug, C.; Edon, V.; Hugon, M. C.; Agius, B.; Baumvol, I. J. R. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Bastos, K. P.; Salvador, L.; Krug, C.; Edon, V.; Hugon, M. C.; Agius, B.; Baumvol, I. J. R.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 1099-0062)
- Published
- 2007
- Language
- EN
- Field
- Engineering (Physical Sciences)