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Can I read Influence of Si content on Nano-structured Ti–Si–N films coated by pulsed-d.c. plasma enhanced CVD on EtoBox?
Influence of Si content on Nano-structured Ti–Si–N films coated by pulsed-d.c. plasma enhanced CVD by Dayan Ma; Shengli Ma; Kewei Xu is a Engineering article available to read on EtoBox.
What is Influence of Si content on Nano-structured Ti–Si–N films coated by pulsed-d.c. plasma enhanced CVD about?
Multiphase nanocomposite thin films composed of nanocrystalline TiN, nano-sized amorphous Si N , free silicon, and 3 4 occasionally amorphous or nanocrystalline TiSi , were deposited on HSS substrate at 550 8C using an industrial set-up of pulsed-2 d.c. plasma enhanced chemical vapor deposition technique. The composition of the films could be controlled well through adjustment of N flow rate and the mixing ratio of the chlorides. The Si contents in the films varied in a range of 0-40 at.%. ## 2 The microhardness of the coatings increased firstly with increasing Si content, reached a maximum value of about Hv 5700 at the content of 13 at.% Si in the coatings, and then decreased at high Si contents.
Who reads Influence of Si content on Nano-structured Ti–Si–N films coated by pulsed-d.c. plasma enhanced CVD?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Dayan Ma; Shengli Ma; Kewei Xu
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)