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High-Performance NdFeB Films for MEMS by Adnan Danish Khan Lodhi is a document available to read on EtoBox.

What is High-Performance NdFeB Films for MEMS about?

This document summarizes research on sputtering 5μm thick NdFeB films onto silicon substrates at deposition rates up to 18 μm/h. The following key points are made: 1) Films deposited below 450°C have equiaxed grains that decrease in size with increasing temperature, while 500°C films have columnar grains. Remanence increases with temperature up to 1.4T, while coercivity remains 1.6T. 2) The best film, deposited at 500°C, achieves an energy product of 400 kJ/m3, comparable to high-quality sintered magnets

Author

Adnan Danish Khan Lodhi

Language

EN