About this scholarly article

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Correction for etch proximity: new models and applications by Granik, Yuri; Progler, Christopher J. is a scholarly article available to read on EtoBox.

Author

Granik, Yuri; Progler, Christopher J.

Publisher

SPIE

Published

2001