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About this Engineering article
Metal Silicides in CMOS Technology: Past, Present, and Future Trends by Zhang, Shi-Li; Östling, Mikael is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Zhang, Shi-Li; Östling, Mikael
- Publisher
- Taylor and Francis Group; Informa UK (Taylor & Francis); Taylor & Francis; Informa UK Limited (ISSN 1040-8436)
- Published
- 2003
- Language
- EN
- Field
- Engineering (Physical Sciences)