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About this Engineering article
Modeling of Diffusion and Activation of Low Energy Arsenic Implants in Silicon by Chakravarthi, Srinivasan; P.R., Chidambaram; Machala, Charles; Jain, Amitabh; Zhang, Xin is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chakravarthi, Srinivasan; P.R., Chidambaram; Machala, Charles; Jain, Amitabh; Zhang, Xin
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 2002
- Language
- EN
- Field
- Engineering (Physical Sciences)