About this scholarly article

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Actinic aerial image measurement for qualification of defect on 157-nm photomask by Yasui, Takashi; Tanabe, Hiroyoshi; Higashikawa, Iwao; Kuschnerus, Peter; Degel, Wolfgang; Boehm, Klaus; Zibold, Axel M.; Kobiyama, Yuji; Urbach, Jan-Peter; Schilz, Christof M.; Teuber Semmler, Silvio is a scholarly article available to read on EtoBox.

Author

Yasui, Takashi; Tanabe, Hiroyoshi; Higashikawa, Iwao; Kuschnerus, Peter; Degel, Wolfgang; Boehm, Klaus; Zibold, Axel M.; Kobiyama, Yuji; Urbach, Jan-Peter; Schilz, Christof M.; Teuber Semmler, Silvio

Publisher

SPIE

Published

2004