About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Evaluation of roughness transfer from Litho to Etch using CD-SEM by Tanaka, M.; Ishimoto, T.; Kazumi, H.; Cheng, S.; Starikov, Alexander is a scholarly article available to read on EtoBox.

Author

Tanaka, M.; Ishimoto, T.; Kazumi, H.; Cheng, S.; Starikov, Alexander

Publisher

SPIE

Published

2012

Language

EN