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About this Engineering article
In-situ Metrology for End Point Detection during Chemical Mechanical Polishing of Shallow Trench Isolation Structure by Zantye, Parshuram B. ;Mudhivarthi, S. ;Kumar, Ashok ;Evans, David is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Zantye, Parshuram B. ;Mudhivarthi, S. ;Kumar, Ashok ;Evans, David
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)
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