Opening book details…
About this Engineering article
A Critical Examination of Submicron Optical Lithography Using Simulated Projection Images by Rosenbluth, Alan E. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Rosenbluth, Alan E.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1983
- Field
- Engineering (Physical Sciences)