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About this Engineering article
Crystallization kinetics of boron- and germanium-implanted 〈100〉 Si: a balance between doping and strain effects by F. Corni; R. Tonini; G. Ottaviani; M. Servidori; F. Priolo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- F. Corni; R. Tonini; G. Ottaviani; M. Servidori; F. Priolo
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 1992
- Language
- EN
- Field
- Engineering (Physical Sciences)
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