About this scholarly article

Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461) - Ultra low-k porous silicon dioxide films from a plasma process by Qingyan Han, ; Wei Chen, ; Waldfried, C.; Escorcia, O.; Sbrockey, N.M.; Bridgewater, T.J.; Moyer, E.S.; Berry, I. is a scholarly article available to read on EtoBox.

Author

Qingyan Han, ; Wei Chen, ; Waldfried, C.; Escorcia, O.; Sbrockey, N.M.; Bridgewater, T.J.; Moyer, E.S.; Berry, I.

Publisher

IEEE

Published

2001

Language

EN