About this scholarly article

1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Evaluation and reduction of charging damage during metal etching by Omoto, Y.; Ono, T.; Watanabe, S.; Yoshioka, K.; Mizutani, T.; Tokunaga, T. is a scholarly article available to read on EtoBox.

Author

Omoto, Y.; Ono, T.; Watanabe, S.; Yoshioka, K.; Mizutani, T.; Tokunaga, T.

Publisher

American Vacuum Soc

Published

1999