Opening book details…
About this Engineering article
Influence of Acid Diffusion on the Lithographic Performance of Chemically Amplified Resists by J. Nakamura; H. Ban; A. Tanaka is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- J. Nakamura; H. Ban; A. Tanaka
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1992
- Field
- Engineering (Physical Sciences)