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About this Materials Science article
Islands as catalyst for film relaxation in Bi-mediated Ge epitaxy on Si by J Falta; T Schmidt; G Materlik; J Zeysing; G Falkenberg; R.L Johnson is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- J Falta; T Schmidt; G Materlik; J Zeysing; G Falkenberg; R.L Johnson
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 2000
- Field
- Materials Science (Physical Sciences)
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