About this scholarly article

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Design of PACs for high-performance photoresists (I): role of di-esterified PACs having hindered -OH groups by Hanawa, Ryotaro; Novembre, Anthony E.; Uetani, Yasunori; Hanabata, Makoto is a scholarly article available to read on EtoBox.

Author

Hanawa, Ryotaro; Novembre, Anthony E.; Uetani, Yasunori; Hanabata, Makoto

Publisher

SPIE

Published

1992