Opening book details…
About this Engineering article
Si Surface Passivation by Atomic Layer Deposited Al2O3 with In-Situ H2O Prepulse Treatment by Kim, Hogyoung; Choi, Byung Joon is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kim, Hogyoung; Choi, Byung Joon
- Publisher
- Springer-Verlag; The Korean Institute of Electrical and Electronic Material Engineers; Seoul: Korean Institute of Electrical and Electronic Material Engineers, 2009; Test accounts; Springer Science and Business Media LLC (ISSN 1229-7607)
- Published
- 2019
- Language
- EN
- Field
- Engineering (Physical Sciences)