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What is Wet Etching of Tantalum Thin Films about?

This document summarizes a study on wet etching of tantalum thin films using sodium hydroxide (NaOH) and potassium hydroxide (KOH) based solutions. Tantalum films were deposited on silica and yttria-stabilized zirconia substrates using DC sputtering. The films were then patterned and etched in hot NaOH/H2O2 and KOH/H2O2 solutions. Etch rate increased exponentially with temperature and linearly with H2O2 concentration. NaOH solutions exhibited higher etch rates than KOH solutions. Etch rates also increased w

Author

raj823

Language

EN