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Solar Cell of 6.3% Efficiency Employing High Deposition Rate (8 Nm/s) Microcrystalline Silicon Photovoltaic Layer by Yasushi Sobajima; Mitsutoshi Nishino; Taiga Fukumori; Masanori Kurihara; Takuya Higuchi; Shinya Nakano; Toshihiko Toyama; Hiroaki Okamoto is a Engineering article available to read on EtoBox.
What is Solar Cell of 6.3% Efficiency Employing High Deposition Rate (8 Nm/s) Microcrystalline Silicon Photovoltaic Layer about?
Microcrystalline silicon (mc-Si) films deposited at high growth rates up to 8.1 nm/s prepared by veryhigh-frequency-plasma-enhanced chemical vapor deposition (VHF-PECVD) at 18-24 Torr have been investigated. The relation between the deposition rates and input power revealed the depletion of silane. Under high-pressure deposition (HPD) conditions, the structural properties were improved. Furthermore, applying mc-Si to n-i-p solar cells, short-circuit current density (J SC ) was increased in accordance with the improvement of microstructure of i-layer. As a result, a conversion efficiency of 6.30% has been achieved employing the i-layer deposited at 8.1 nm/s under the HPD conditions.
Who reads Solar Cell of 6.3% Efficiency Employing High Deposition Rate (8 Nm/s) Microcrystalline Silicon Photovoltaic Layer?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yasushi Sobajima; Mitsutoshi Nishino; Taiga Fukumori; Masanori Kurihara; Takuya Higuchi; Shinya Nakano; Toshihiko Toyama; Hiroaki Okamoto
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0927-0248)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)