Skip to content

Opening book details…

About this Engineering article

Thermal Stability of Copper Contact Metallization Using Ru-Containing Liner by Seo, S.-C.; Yang, C.-C.; Hu, C.-K.; Kerber, A.; Fan, S.; Horak, D.; Canaperi, D.; Papa Rao, S.; Haran, B.; Doris, B. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Seo, S.-C.; Yang, C.-C.; Hu, C.-K.; Kerber, A.; Fan, S.; Horak, D.; Canaperi, D.; Papa Rao, S.; Haran, B.; Doris, B.
Publisher
The Electrochemical Society; Electrochemical Society, Inc. (ISSN 1099-0062)
Published
2011
Field
Engineering (Physical Sciences)

More by Seo, S.-C.; Yang, C.-C.; Hu, C.-K.; Kerber, A.; Fan, S.; Horak, D.; Canaperi, D.; Papa Rao, S.; Haran, B.; Doris, B.

Browse all works by Seo, S.-C.; Yang, C.-C.; Hu, C.-K.; Kerber, A.; Fan, S.; Horak, D.; Canaperi, D.; Papa Rao, S.; Haran, B.; Doris, B.