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Can I read Combined AES and TOF-SIMS analysis of a thermally treated Ag/Ti/Al metallization system on EtoBox?
Combined AES and TOF-SIMS analysis of a thermally treated Ag/Ti/Al metallization system by U. Scheithauer; R. Treichler is a Engineering article available to read on EtoBox.
What is Combined AES and TOF-SIMS analysis of a thermally treated Ag/Ti/Al metallization system about?
## Abstract Both Auger electron spectroscopy (AES) and time‐of‐flight secondary ion mass spectroscopy (TOF‐SIMS) were applied to study a three‐layer backside metallization stack that was thermally treated up to temperatures above the normal process temperature. In addition to conventional sputter depth profiling, we applied a more sophisticated sample preparation method—__in situ__ low angle cross sectioning. This way the depth scale was enlarged approximately by a factor of 20, and therefore transferred to lateral dimensions. This allows a more detailed AES analysis of the metallization system using mappings of elemental distributions. The TOF‐SIMS depth profiles were recorded as a function of the lateral geometric coordinates and in depth as a function of the sputter ion dose. This way it was possible to analyse the three‐dimensional sample composition. Copyright © 2006 John Wiley & Sons, Ltd.
Who reads Combined AES and TOF-SIMS analysis of a thermally treated Ag/Ti/Al metallization system?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- U. Scheithauer; R. Treichler
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)