About this scholarly article

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Scanning holographic scatterometer for wafer surface inspection by Klooster, Alex; Silver, Richard M.; Marks, James; Hanson, Kael; Sawatari, Takeo is a scholarly article available to read on EtoBox.

Author

Klooster, Alex; Silver, Richard M.; Marks, James; Hanson, Kael; Sawatari, Takeo

Publisher

SPIE

Published

2004