About this scholarly article

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Integrated Circuit Metrology, Inspection, and Process Control VII - New low-voltage SEM technology for imaging and metrology of submicrometer contact holes and other high-aspect-ratio structures by Monahan, Kevin M.; Toro-Lira, Guillermo L.; Davidson, Mark P.; Postek, Michael T. is a scholarly article available to read on EtoBox.

Author

Monahan, Kevin M.; Toro-Lira, Guillermo L.; Davidson, Mark P.; Postek, Michael T.

Publisher

SPIE

Published

1993

Language

EN