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About this Chemistry article
High-speed Photographic Analysis of Microwave Plasma Torch Source Behaviour by Yu, Bingwen; Jin, Wei; Ying, Yangwei; Yu, Haixiang; Zhu, Dan; Shan, Jin; Liu, Wenlong; Xu, Chen; Jin, Qinhan is a Chemistry article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Chemistry.
- Author
- Yu, Bingwen; Jin, Wei; Ying, Yangwei; Yu, Haixiang; Zhu, Dan; Shan, Jin; Liu, Wenlong; Xu, Chen; Jin, Qinhan
- Publisher
- Royal Society of Chemistry; The Royal Society of Chemistry; Royal Society of Chemistry (RSC) (ISSN 0267-9477)
- Published
- 2016
- Language
- EN
- Field
- Chemistry (Physical Sciences)