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About this Engineering article
Photo-enhanced Negative Differential Resistance and Photo-accelerated Time-dependent Dielectric Breakdown in Thin Nitride-oxide Dielectric Film by Chen, Fen; Li, Baozhen; Jammy, Rajarao; Dufresne, Roger A.; Strong, Alvin W. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chen, Fen; Li, Baozhen; Jammy, Rajarao; Dufresne, Roger A.; Strong, Alvin W.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)
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