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Review of Fin FET Technology and Circuit Design Challenges: Bibin Lawrence R, Jency Rubia J by Nisha Chugh is a document available to read on EtoBox.

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The document reviews FinFET technology as an alternative to traditional planar CMOS transistors, highlighting its advantages in gate control and performance while addressing challenges such as fin shape, doping, and circuit design. It discusses the evolution of FinFETs, their manufacturing challenges, and the implications for SRAM design and the broader circuit design ecosystem. The paper concludes that FinFET technology is becoming increasingly prevalent in high-performance logic applications and that the

Author

Nisha Chugh

Language

EN