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About this Engineering article
On the Monte Carlo simulation program “RESIS” for electron exposure of resists by P.R. Deshmukh; W.S. Khokle is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P.R. Deshmukh; W.S. Khokle
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0038-1101)
- Published
- 1989
- Field
- Engineering (Physical Sciences)