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About this scholarly article
2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443) - 30 nm device channel profile optimization for digital application by using numerical simulation by Gongchuan Li, ; Wenli Wang, ; Liyun Qi, ; Joardar, K. is a scholarly article available to read on EtoBox.
- Author
- Gongchuan Li, ; Wenli Wang, ; Liyun Qi, ; Joardar, K.
- Publisher
- IEEE
- Published
- 2001
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