About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Characterization of 1D layout technology at advanced nodes and low k1 by Lai, Kafai; Erdmann, Andreas; Axelrad, V.; Mikami, K.; Smayling, M.; Tsujita, K.; Yaegashi, H. is a scholarly article available to read on EtoBox.

Author

Lai, Kafai; Erdmann, Andreas; Axelrad, V.; Mikami, K.; Smayling, M.; Tsujita, K.; Yaegashi, H.

Publisher

SPIE

Published

2014