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About this Physics and Astronomy article
Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis by Lu, Junling ;Elam, Jeffrey W. ;Stair, Peter C is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Lu, Junling ;Elam, Jeffrey W. ;Stair, Peter C
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-5729)
- Published
- 2016
- Field
- Physics and Astronomy (Physical Sciences)
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