About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Understanding the behavior of laser-produced tin plasma by time-resolved spectroscopy and simulations of their spectra by Kambali, I.; La Fontaine, Bruno M.; Naulleau, Patrick P.; McCormack, T.; Scally, E.; White, J.; O'Reilly, F.; Sheridan, P.; O'Sullivan, G. D. is a scholarly article available to read on EtoBox.

Author

Kambali, I.; La Fontaine, Bruno M.; Naulleau, Patrick P.; McCormack, T.; Scally, E.; White, J.; O'Reilly, F.; Sheridan, P.; O'Sullivan, G. D.

Publisher

SPIE

Published

2011