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About this Physics and Astronomy article
Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process by V. K. Kamineni; M. Raymond; E. J. Bersch; B. B. Doris; A. C. Diebold is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- V. K. Kamineni; M. Raymond; E. J. Bersch; B. B. Doris; A. C. Diebold
- Publisher
- American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
- Published
- 2010
- Field
- Physics and Astronomy (Physical Sciences)
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