Can I read Investigation of thin films by soft X-ray fluorescence and by total electron yield measurements on EtoBox?

Investigation of thin films by soft X-ray fluorescence and by total electron yield measurements by H. Ebel; M. Mantler; R. Svagera; R. Kaitna is a Engineering article available to read on EtoBox.

What is Investigation of thin films by soft X-ray fluorescence and by total electron yield measurements about?

## Abstract We propose a description of the sampling depth (λ) of total electron yield experiments (TEY) in terms of kinetic Auger electron energies. This empirical response results from literature data^1 – 6^ on low energy (<2 keV) and from our own experiments performed on thin layers of Cu on Fe substrates and on thin layers of Al~__x__~Ga~1 − __x__~As on GaAs substrates at energies of approximately 5to 8 keV. From these investigations we estimate a sampling depth of 74 nm for Ga KLL Auger electrons in Al~__x__~Ga~1 − __x__~As. For comparison, the sampling depth of x‐ray fluorescence analysis (XRF) for Al Kα radiation in Al~__x__~Ga~1 − __x__~As is 400 nm. Both methods (XRF and TEY) were joined for quantitative determination of the thickness __t__ and the Al content __x__ in thin Al~__x__~Ga~1 − __x__~As layers on GaAs substrates. Al Kα fluorescence radiation excited by polychromatic x‐radiation and the jump of the total electron yield in the vicinity of the GaK‐edge were used in our analytical model. The validity of this model is verified by a comparison of our results with the expected values (known from preparation of the layers).

Who reads Investigation of thin films by soft X-ray fluorescence and by total electron yield measurements?

Author

H. Ebel; M. Mantler; R. Svagera; R. Kaitna

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)

Published

1994

Language

EN

Field

Engineering (Physical Sciences)