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About this Engineering article
Exploring the Effects of Placement and Electron Angular Distribution on Two Adjacent Mask Holes During Plasma Etching Process by Zhang, Peng; Zhang, Lidan; Lv, Kemin is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Zhang, Peng; Zhang, Lidan; Lv, Kemin
- Publisher
- Springer; Springer-Verlag; Kluwer Academic/Plenum Publishers; Springer Science and Business Media LLC (ISSN 0272-4324)
- Published
- 2020
- Field
- Engineering (Physical Sciences)