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About this Engineering article
Comment on ‘‘Effects of electron cyclotron resonance plasma thermal oxidation on the properties of polycrystalline silicon film’’ [Appl. Phys. Lett. 67, 1880 (1995)] by N. H. Nickel is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- N. H. Nickel
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1996
- Language
- EN
- Field
- Engineering (Physical Sciences)