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About this Engineering article
Gas-efficient Deposition of Device-quality Hydrogenated Amorphous Silicon Using Low Gas Flows and Power Modulated Radio-frequency Discharges by Biebericher, A. C. W.; van der Weg, W. F.; Rath, J. K.; Akdim, M. R.; Goedheer, W. J. is a Engineering article available to read on EtoBox.
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- Author
- Biebericher, A. C. W.; van der Weg, W. F.; Rath, J. K.; Akdim, M. R.; Goedheer, W. J.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2003
- Field
- Engineering (Physical Sciences)