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About this Engineering article
323. Nondestructive measurement of the penetration depth for diffusion in silicon: H Schewelies,Phys Status Solidi, 1 (2), 1964, 187–189, (in Germany) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0042-207X)
- Published
- 1965
- Language
- EN
- Field
- Engineering (Physical Sciences)