About this scholarly article

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - A high throughput PMOS Source-Drain process optimized within FINFET architecture for high volume chip manufacturing by Mahadevapuram, Rakesh C; Kaushal, Vikas K; Raviswaran, Arvind is a scholarly article available to read on EtoBox.

Author

Mahadevapuram, Rakesh C; Kaushal, Vikas K; Raviswaran, Arvind

Publisher

IEEE

Published

2020