About this scholarly article

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Predictive process control for sub-0.2-um lithography by Zavecz, Terrence E.; Blanquies, Rene M.; Sullivan, Neal T. is a scholarly article available to read on EtoBox.

Author

Zavecz, Terrence E.; Blanquies, Rene M.; Sullivan, Neal T.

Publisher

SPIE

Published

2000