About this scholarly article

1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Reduction and non-uniformity of high density plasma process induced electrical degradation in MOS devices by Pei-Jer Tzeng, ; Jen-Chieh Li, ; Chun-Chen Yeh, ; Kuei-Shu Chang-Liao, is a scholarly article available to read on EtoBox.

Author

Pei-Jer Tzeng, ; Jen-Chieh Li, ; Chun-Chen Yeh, ; Kuei-Shu Chang-Liao,

Publisher

American Vacuum Soc

Published

1999