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About this Materials Science article
Oxidation of Plasma Enhanced Chemical Vapour Deposited Silicon Nitride and Oxynitride Films by C.M.M. Denisse; H.E. Smulders; F.H.P.M. Habraken; W.F. Van der Weg is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- C.M.M. Denisse; H.E. Smulders; F.H.P.M. Habraken; W.F. Van der Weg
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 1989
- Language
- EN
- Field
- Materials Science (Physical Sciences)
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