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About this Engineering article
Submicro- and Nanometer E-beam Lithography and Reactive Ion Etching with Single Layer Chemically Amplified Negative Resist by I.W. Rangelow; P. Hudek; I. Kostič; Z. Borkowicz; G. Stangl is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- I.W. Rangelow; P. Hudek; I. Kostič; Z. Borkowicz; G. Stangl
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 1994
- Field
- Engineering (Physical Sciences)