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About this Engineering article
Fractional Talbot lithography with extreme ultraviolet light by Kim, Hyun-su; Li, Wei; Danylyuk, Serhiy; Brocklesby, William S.; Marconi, Mario C.; Juschkin, Larissa is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kim, Hyun-su; Li, Wei; Danylyuk, Serhiy; Brocklesby, William S.; Marconi, Mario C.; Juschkin, Larissa
- Publisher
- Optical Society of America; The Optical Society (ISSN 0146-9592)
- Published
- 2014
- Field
- Engineering (Physical Sciences)